Friday 4.7.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
UHV-XPS
UHV-SPM
ML3-BABY
VERSALAB
KRATOS-XPS
RIGAKU9
RIGAKU3
SUSS-WETBENCH
EVAPORATOR
ULTRAFAST-LASER
RAITH
LITESCOPE-LYRA
HELIOS
UHV-MBE
DHR
UHV-LEEM
UHV-DEPOSITION
SUSS-MA8
PARYLENE-SCS
LAKESHORE
CRYOGENIC
TITAN
UHV-PREPARATION
DWL
DAWN-HELEOS
R2-PECVD
MIRA-STAN
ALD
BET-DEGASSER
LAURELL-NANO
BRILLOUIN
NMR
CHEMLAB-B1.18
FTIR
LEICACOAT-STAN
FTIR-CHEMLAB
NANOINDENTER
RIE-FLUORINE
LVEM
SUMMIT
SHAKER…
SEE-SYSTEM
SIMS
LaserMIRA
MPS150
ICON-SPM
SUSS-RCD8
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
DIENER
TERS
RIE-CHLORINE
MINIFLEX
STEMI
nanoCT
RSA
MIRA-EBL
SNOM-NANONICS
NANOCALC
Test O1
BET-ANAMET
CITOVAC
UHV-LEIS
UHV-PLD
US-CUTTER
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
VACUUM_OVEN-B1…
UHV…
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
microCT
ZWICK
UHV-FTIR
UHV…
SW-BEAMER
PARYLENE-DIENER
SW-LAB
SW-TRACER
LEICA-TXP
TENUPOL
FISCHIONE-160
Test Ondra 3
Test O2
TEST2
UHV-CLUSTER
Test školení
TEST-RFID2
TGA96
THEORY-SUPPORT
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
PECVD
MONOWAVE
3D-PRUSA-ORANGE
FUMEHOOD…
LECTROPOL
ELECTROWORKSHOP
R4…
FLOWBOX
LYRA
4-POINT
FTIRMAG
FUMEHOOD-HF
DRYING_OVEN-B1…
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
FUME_HOOD-B1.18
CLARUS-680
GLOVEBOX
TEGRAMIN
SPONGEBOB
DIMPLING…
VERIOS
TUBE-FURNACE
APCVD
NANOWIZARD
DISCO-DICING…
BAMBULAB
VACUUM_OVEN…
MECHANICAL…
CEITEC-NANO
CLR-ISO8-Lab…
DRIE
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
CRYOMILL
SW-CT
VNA-MPI
PECVD-NANOFAB
3D-PRUSA-BLACK
ARES
HENRY-MAGNET
MAGNETRON
DEKTAK
MOCVD
LABOTOM5
WOOLLAM-MIR
DSC-DISCOVERY
CITOPRESS
PROTOMAT
NANOSCAN
NANOSAM
NIRQUEST512
WOOLLAM-VIS
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
KERR-MICROSCOPE
LPCVD-SiN
LEICACOAT-NANO
KAUFMAN
FRASCAN
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
IR-RAMAN
LPCVD-polySi
K70
KEITHLEY-4200
LASER-DICER
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-MIRA…
ZETASIZER
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Hrůza, Dominik
Supalová, Linda
T Panda, Jaganandha
Kumari, Archana
Niapos, Eleftherios
Mirdamadi Khouzani, Sayed Hossein
Tahsin, Muhammad
E Novák, Jiří
Staňo, Michal
Bednaříková, Vendula
Havlíková, Tereza
Jakešová, Marie
Fanisaberi, Amirmohsen
Supalová, Linda
Jakešová, Marie
Arregi Uribeetxebarria, Jon Ander
Peña Espinoza, Francisco Javier
Klok, Pavel
Huang, Yong
S Danchuk, Viktor
Wirthová, Michaela
Hrůza, Dominik
Hrůza, Dominik
Jakešová, Marie
Jakešová, Marie
Holcman, Vladimír
Panda, Jaganandha
S Michalička, Jan
Hrůza, Dominik
Fecko, Peter
Kotouček, Jan
Blahová, Lucie
Lepcio, Petr
BUI, Thanh Lam
Tmejová, Kateřina
Jakešová, Marie
Delforge, Cyril
Kreuzerová, Monika
Wirthová, Michaela
Nebojsa, Alois
Lepcio, Petr
T Lepcio, Petr
Buršíková, Vilma
Jakešová, Marie
Kolíbalová, Eva

Upcoming trainings

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Term Name Description Max. attendees
4.7. 09:30 - 13:30 FTIR-CHEMLAB - Hyperion microscope Training on the Hyperion microscope. Attendees: Sujit Deshmukh, Sanjay Kumar 2
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10