Saturday 28.6.2025
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
RIGAKU9
VNA-MPI
HENRY-MAGNET
RAITH
UHV-MBE
LITESCOPE-LYRA
R2-PECVD
LAKESHORE
CRYOGENIC
RIGAKU3
MAGNETRON
NANOINDENTER
BRILLOUIN
SUMMIT
ICON-SPM
SW-BEAMER
BET-ANAMET
SNOM-NANONICS
STEMI
TERS
NANOCALC
LaserMIRA
MIRA-STAN
PARYLENE-SCS
SIMS
SHAKER…
RSA
SEE-SYSTEM
MIRA-EBL
MPS150
nanoCT
SAW-ACCUTOM
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
PARYLENE-DIENER
PECVD
MIRKA
SPINCOATER…
MINIFLEX
Q-LAB
RTP
ACCURION_RSE
SUSS-RCD8
DIENER
RIE-FLUORINE
SW-LAB
RIE-CHLORINE
TENUPOL
SW-TRACER
FTIR
UHV-SPM
ULTRAFAST-LASER
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
CITOVAC
UHV-PREPARATION
VACUUM_OVEN-B1…
VUVAS
VISCOMETER
WIRE-BONDER
WITEC-RAMAN
XEF2
KRATOS-XPS
microCT
ZWICK
UHV-PLD
UHV-XPS
LEICA-TXP
TGA96
NMR
FISCHIONE-160
Test Ondra 3
Test O2
Test O1
TEST2
Test školení
TEST-RFID2
THEORY-SUPPORT
UHV-LEIS
TGA-DISCOVERY
UHV-MBE2
UHV-MBE1
UHV-CLUSTER
UHV…
UHV…
UHV-DEPOSITION
UHV-FTIR
UHV-LEEM
ZEISS-NANO
MONOWAVE
WOOLLAM-VIS
FLOWBOX
DIMPLING…
DRYING_OVEN-B1…
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
R4…
HELIOS
DRIE
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUME_HOOD-B1.14
DHR
SW-CT
CLARUS-680
CEITEC-NANO
APCVD
NANOWIZARD
ALD
DISCO-DICING…
BAMBULAB
BET-DEGASSER
VACUUM_OVEN…
MECHANICAL…
TUBE-FURNACE
CRYOMILL
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
TIC3X
VERSALAB
FUME_HOOD-B1.18
DAWN-HELEOS
NIRQUEST512
DEKTAK
LITESCOPE-MIRA…
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
PROTOMAT
LVEM
KERR-MICROSCOPE
SUSS-MA8
MOCVD
LIBS-Discovery
LABOTOM5
WOOLLAM-MIR
ML3-BABY
DSC-DISCOVERY
ARES
CITOPRESS
NANOSCAN
NANOSAM
LIBS-LabSys1
LIBS-FireFly
GLOVEBOX
CHEMLAB-B1.18
TEGRAMIN
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
FRASCAN
TITAN
CHEMLAB-B1.14
CHEMLAB-B1.16
IS_NOVOCONTROL
LAURELL-NANO
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
KEITHLEY-4200
LASER-DICER
ZETASIZER
Varshney, Devanshu
Niapos, Eleftherios
Klíma, Jan
Panda, Jaganandha
Peña Espinoza, Francisco Javier
S Danchuk, Viktor
Klok, Pavel
Blahová, Lucie
Holcman, Vladimír
Klíma, Jan
B Roupcová, Pavla
U Prášek, Jan
Buršíková, Vilma
Delforge, Cyril

Upcoming trainings

Show more

Term Name Description Max. attendees
8.7. 09:30 - 17:00 RAITH training 2/4 Introduction to the Nanosuite software and basic functions. Pattern design in this software, adjustment, and alignment of the sample and beam in the write fields. Simple electron beam lithography with Demo pattern. Checking of the field stitching and overlay. Attendees: Martino Pistis 2
8.7. 09:30 - 14:00 RAITH training 1/4 Introduction to the RAITH150 Two system and the Electron Optics software. Preparation of the sample, loading, and unloading procedure. Beam precise setting in the Electron Optics software. During the first training, the trainee will try the basic operation of the lithograph. Attendees: Martino Pistis 2
9.7. 09:00 - 13:30 DHR Basic rheology training. Meeting point at the rheometer. Attendees: Hongbo Fu 2
9.7. 13:30 - 15:00 DRS basic training Training will give you knowledge about how to: Operate the measurement system confidently. Prepare appropriate samples for dielectric testing. Attendees: Bindu Kalleshappa, Hongbo Fu 2
14.7. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. Attendees: Anna Jančík Procházková, Kajal Sharma, Helena Šimůnková 5
15.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Kajal Sharma, Sliusar Iryna 5
15.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Anna Jančík Procházková, Navaj Shaikh 10
15.7. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Anna Jančík Procházková, Daina Dayana Arenas Buelvas 10
11.8. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. 5
12.8. 12:15 - 12:50 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for the Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151. It must be finished 2 work days before the excursion. 5
12.8. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
12.8. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
12.8. 14:25 - 14:55 Safety excursion - StAn lab 10