Monday 29.4.2024
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
LEICACOAT-STAN
SUSS-WETBENCH
UHV-PREPARATION
MIRA-STAN
LYRA
VERIOS
ML3-BABY
RIE-FLUORINE
WIRE-BONDER
UHV-SPM
MAGNETRON
UHV-LEEM
MIRA-EBL
UHV-DEPOSITION
UHV-PLD
TEGRAMIN
CHEMLAB-B1.14
FUMEHOOD…
UHV-XPS
VERSALAB
RIGAKU3
CPD
WITEC-RAMAN
RIGAKU9
LABOTOM5
TGA96
SAW-ACCUTOM
CITOPRESS
LASER-DICER
STEMI
NANOCALC
UHV-FTIR
ICON-SPM
KERR-MICROSCOPE
DEKTAK
MPS150
UHV-LEIS
UHV-MBE
ALD
KRATOS-XPS
BRILLOUIN
MECHANICAL…
3D-PRUSA-BLACK
CLR-ISO8-Lab…
LEXT
CRYOMILL
SUSS-RCD8
FTIR
ZEISS-NANO
WOOLLAM-VIS
EVAPORATOR
NANOSAM
ULTRAFAST-LASER
HELIOS
FUMEHOOD-HF
DIENER
SNOM-NANONICS
nanoCT
TERS
RIE-CHLORINE
SIMS
RTP
PARYLENE
UHV-MBE2
SEE-SYSTEM
UHV-CLUSTER
microCT
XEF2
VUVAS
CITOVAC
FTIR-CHEMLAB
JAZ3-CHANNEL
JASCO
DWL
US-CUTTER
UHV-MBE1
LaserMIRA
THEORY-SUPPORT
FISCHIONE-160
TENUPOL
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
BET-ANAMET
DICING-SAW
SUMMIT
Q-LAB
WOOLLAM-MIR
PECVD
ELECTROWORKSHOP
LEICACOAT-NANO
PECVD-NANOFAB
VNA-MPI
GLOVEBOX
DAWN-HELEOS
CLARUS-680
FUMEHOOD…
FUMEHOOD…
FTIRMAG
FLOWBOX
R4…
LECTROPOL
TITAN
SPONGEBOB
RAITH
DIMPLING…
DHR
DRIE
TIC3X
MINIEVAP
SW-COMSOL
TUBE-FURNACE
CEITEC-NANO
BET-DEGASSER
NANOWIZARD
FRASCAN
NANOINDENTER
3D-PRUSA-ORANGE
LAKESHORE
3D-PRUSA-BLUE
ULTRACENTRIFUGE
NMR
NIRQUEST512
NANOSCAN
MONOWAVE
APCVD
MOCVD
SUSS-MA8
HENRY-MAGNET
PROTOMAT
CRYOGENIC
LPCVD-SiN
ZEISS-STAN
LPCVD-polySi
LITESCOPE-MIRA…
LITESCOPE-LYRA
LIBS-Discovery
LIBS FireFly
LAURELL-NANO
R2-PECVD
KEITHLEY-4200
IR-RAMAN
KAUFMAN
FISCHIONE-TEM…
SCIA
ZETASIZER
Černá, Eva
Pejchalová, Lucie
Kalleshappa, Bindu
Šťastný, Přemysl
Saadati, Arezoo
Kumar, Sanjay
Migliaccio, Ludovico
Idesová, Beáta
Citterberg, Daniel
Citterberg, Daniel
Martyniuk, Oleh
U Danchuk, Viktor
Jakub, Zdeněk
Molnár, Tomáš
Kurowská, Anna
Virágová, Eliška
Černá, Eva
Kalleshappa, Bindu
Mařák, Vojtěch
Shahnazarova, Gubakhanim
Potoček, Michal
Migliaccio, Ludovico
Šimek, Antonín
Velluvakandy, Roshan
Mirdamadi Khouzani, Sayed Hossein
Siddiqui, Maliha
Pejchalová, Lucie
Zahradníček, Radim
Citterberg, Daniel
Martyniuk, Oleh
Migliaccio, Ludovico
Zadorozhnii, Oleksii
Zadorozhnii, Oleksii
Jarušek, Jaromír
Jarušek, Jaromír
Jarušek, Jaromír
U Danchuk, Viktor
Jakub, Zdeněk
Jakub, Zdeněk
U Prášek, Jan
Niapos, Lefteris
Prášek, Jan
U Danchuk, Viktor
Jakub, Zdeněk
Molnár, Tomáš
Migliaccio, Ludovico
Děcký, Marek
U Danchuk, Viktor
Jakub, Zdeněk
U Danchuk, Viktor
Kepič, Peter
Mařák, Vojtěch
Rotter, Marek
Tmejová, Kateřina
Jakešová, Marie
Zita, Jiří
Zita, Jiří
U Danchuk, Viktor
Hrůza, Dominik
Niapos, Lefteris
Lukiienko, Iryna
Pham, Sy Nguyen
Rotter, Marek
Zita, Jiří
Zita, Jiří
Bakhshikhah, Mahan
paiva de araujo, Estacio
Varshney, Devanshu
Varshney, Devanshu
Skálová, Zdenka
Šťastný, Přemysl
Valášek, Daniel
Valášek, Daniel
Martyniuk, Oleh
Siddiqui, Maliha
Idesová, Beáta
U Danchuk, Viktor
Kovařík, Martin
Otýpka, Martin
Citterberg, Daniel
Děcký, Marek
U Danchuk, Viktor
U Danchuk, Viktor
Idesová, Beáta
S Polčák, Josef
Knauer, Sebastian
Varga, Dominik
Jarušek, Jaromír
Musil, Vojtěch
Lepcio, Petr
Valášek, Daniel
Zahradníček, Radim
Souawda, Nada
Zita, Jiří
MASCARETTI, Luca
Děcký, Marek
Michal, Staňo
Arregi Uribeetxebarria, Jon Ander
Bukvišová, Kristýna
Citterberg, Daniel

Upcoming trainings

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Term Name Description Max. attendees
20.5. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send (nano@ceitec.vutbr.cz) beforehand this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
21.5. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Alex Yohannan, Kaaviah Manoharan, AHMED ELOZIRI 2
21.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jeong Pil Kim, Kaaviah Manoharan 5
21.5. 13:30 - 15:30 RIE-flourine -training Before the training, you need to take a moodle course on dry etching and finish it with a quiz. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=30 Attendees: Claudia Lubrano, AHMED ELOZIRI, Gubakhanim Shahnazarova 3
21.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Xianghua Wu, Peter Kunnas, Hyesung Lee, Lukas Schretter, Hongbo Fu, Vladimír Prajzler 10
21.5. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Aida Fazlič, Xianghua Wu, Fateh Bahadur, AHMED ELOZIRI, Peter Kunnas, Hyesung Lee, Lukas Schretter, Hongbo Fu, Vladimír Prajzler, Lenka Michlovská 10
22.5. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle courses <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> and <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=38> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Fateh Bahadur, Peter Kunnas, Lukas Schretter 3
22.5. 09:00 - 09:45 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151 Attendees: Aida Fazlič, Radha Bhardwaj, Sanjay Kumar, Claudia Lubrano, Hyesung Lee, Hongbo Fu 6
22.5. 14:00 - 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Lukas Schretter 1
23.5. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: AHMED ELOZIRI 2
23.5. 12:00 - 13:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Peter Kunnas 1
23.5. 13:30 - 15:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Fateh Bahadur 1
4.6. 09:00 - 16:00 LiteScope MIRA StAn - Basic training Basic training for LiteScope AFM-in-SEM, focused on the simultaneous topography and SEM measurement (CPEM). This training is prerequisite for other imaging modes. For more information, please refer to the moodle page: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=166 Attendees: Alex Yohannan, Kaaviah Manoharan 4
5.6. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with a valid Mira-STAN certificate. Meeting point at the microscope. Attendees: Alex Yohannan, Fateh Bahadur, Kaaviah Manoharan 4
5.6. 09:30 - 11:30 ICON-SPM basic training Before you assign for this practical training, complete all mandatory prerequisites on CF Moodle educational platform: https://cfmoodle.ceitec.vutbr.cz/ Two courses are mandatory: 1) Course Scanning probe microscopy basics (in section General training- Microscopy) 2) Course ICON-SPM – Bruker – Dimension ICON (in section Equipment training – Nanocharacterization laboratory) Sign up to the CF Moodle with the same login as you use for the booking system. Enroll to the above-mentioned courses and follow the instructions within the courses. If you have difficulties with enrolling yourself to a course or any other troubles with Moodle, contact evelina.gablech@ceitec.vutbr.cz for help. It is not possible to take part in practical training without completed mandatory prerequisites prior to the training! Courses must be completed until 31.5.2024. User will not receive any reminder to complete the courses. Thus, it is the user's full responsibility to meet the stated prerequisites by the given deadline. Practical training is only for 3 persons. If the capacity of the training is already full, please do not sign up. Meeting point: Directly in the SPM laboratory. Attendees: Dabosmita Paul 3
6.6. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Anna Konečná, Aida Fazlič, Yue Wang 3
17.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send beforehand (nano@ceitec.vutbr.cz) this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
18.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
18.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
18.6. 14:25 - 14:55 Safety excursion - StAn lab 10
20.6. 09:00 - 15:30 MIRA-STAN part 1/2 Users must meet all prerequisites 3 days before the training to get admitted. More details are available at Ceitec Nano Moodle: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76 Meeting point at the microscope. This is a two-step training, register for the part 2 in our booking system. Attendees: Quynh Nhu Thi Tran, Muhammad Tahsin, Gubakhanim Shahnazarova, Hyesung Lee 4
26.6. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Gubakhanim Shahnazarova, Hyesung Lee 2
27.6. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Quynh Nhu Thi Tran, Muhammad Tahsin 2
27.6. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Alex Yohannan, Hyesung Lee 3
15.7. 10:30 - 10:30 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send beforehand (nano@ceitec.vutbr.cz) this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
16.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
16.7. 14:25 - 14:55 Safety excursion - StAn lab 10
18.7. 09:00 - 15:30 MIRA-STAN part 1/2 Users must meet all prerequisites 3 days before the training to get admitted. More details are available at Ceitec Nano Moodle: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76 Meeting point at the microscope. This is a two-step training, register for the part 2 in our booking system. 4
25.7. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. 2
30.7. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. 2