Thursday 25.4.2024
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
KERR-MICROSCOPE
MIRA-STAN
CHEMLAB-B1.14
LEICACOAT-STAN
RIE-FLUORINE
ICON-SPM
VERIOS
UHV-LEEM
EVAPORATOR
RIGAKU3
WITEC-RAMAN
KRATOS-XPS
RAITH
SUSS-WETBENCH
UHV-DEPOSITION
UHV-PREPARATION
LYRA
SAW-ACCUTOM
SPONGEBOB
TEGRAMIN
DRIE
VERSALAB
DIENER
TGA96
DHR
TITAN
WOOLLAM-VIS
SUSS-RCD8
ALD
NANOSAM
CITOPRESS
NANOSCAN
RTP
PARYLENE
R2-PECVD
ML3-BABY
LAURELL-NANO
LPCVD-SiN
DEKTAK
LEICACOAT-NANO
BRILLOUIN
RIGAKU9
UHV-SPM
CRYOMILL
SUSS-MA8
RIE-CHLORINE
ULTRAFAST-LASER
HELIOS
FTIR-CHEMLAB
UHV-PLD
STEMI
FUMEHOOD-HF
FTIR
3D-PRUSA-BLACK
CRYOGENIC
UHV-LEIS
MIRA-EBL
MAGNETRON
LEXT
TERS
LaserMIRA
SEE-SYSTEM
SIMS
SNOM-NANONICS
nanoCT
microCT
WIRE-BONDER
TENUPOL
SUMMIT
UHV-CLUSTER
CITOVAC
JAZ3-CHANNEL
JASCO
DWL
US-CUTTER
UHV-XPS
UHV-MBE
XEF2
UHV-FTIR
UHV-MBE1
DICING-SAW
UHV-MBE2
THEORY-SUPPORT
FISCHIONE-160
VUVAS
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
BET-ANAMET
NANOCALC
MPS150
WOOLLAM-MIR
Q-LAB
ELECTROWORKSHOP
VNA-MPI
GLOVEBOX
DAWN-HELEOS
CLARUS-680
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FTIRMAG
FLOWBOX
R4…
LECTROPOL
FRASCAN
DIMPLING…
TIC3X
CPD
MINIEVAP
SW-COMSOL
CLR-ISO8-Lab…
TUBE-FURNACE
CEITEC-NANO
MECHANICAL…
BET-DEGASSER
NANOWIZARD
PECVD-NANOFAB
NANOINDENTER
PECVD
PROTOMAT
3D-PRUSA-ORANGE
3D-PRUSA-BLUE
ULTRACENTRIFUGE
ZEISS-NANO
NMR
NIRQUEST512
MONOWAVE
APCVD
LABOTOM5
MOCVD
HENRY-MAGNET
LAKESHORE
ZEISS-STAN
LPCVD-polySi
LITESCOPE-MIRA…
LITESCOPE-LYRA
LIBS-Discovery
LIBS FireFly
LASER-DICER
KEITHLEY-4200
IR-RAMAN
KAUFMAN
FISCHIONE-TEM…
SCIA
ZETASIZER
Niapos, Lefteris
Otýpka, Martin
Holobrádek, Jakub
Holobrádek, Jakub
Zadorozhnii, Oleksii
T Lepcio, Petr
Pavliňák, David
Bhardwaj, Radha
Remešová, Michaela
Neettiyath, Aparna
Tmejová, Kateřina
Souawda, Nada
T Tmejová, Kateřina
Tmejová, Kateřina
Pavliňák, David
Cao, Hoang-Anh
Cherukutty Ramakrishnan, Minitha
Prášek, Jan
Zadorozhnii, Oleksii
Zadorozhnii, Oleksii
Michal, Staňo
Pikna, Štěpán
Kepič, Peter
Kolíbalová, Eva
Cao, Hoang-Anh
Siddiqui, Maliha
David, Jiří
Stará, Veronika
U Polčák, Josef
Tvrdoňová, Anna
Prášek, Jan
Kunc, Jan
T Roupcová, Pavla
Valášek, Daniel
Šťastný, Přemysl
paiva de araujo, Estacio
Mařák, Vojtěch
Kepič, Peter
B Polčák, Josef
S Polčák, Josef
Zita, Jiří
Zita, Jiří
Citterberg, Daniel
Hrdý, Radim
David, Jiří
Stará, Veronika
David, Jiří
Stará, Veronika
Kunc, Jan
di Croce, Francesca
Valášek, Daniel
Valášek, Daniel
Tvrdoňová, Anna
Tvrdoňová, Anna
Skálová, Zdenka
Skálová, Zdenka
Citterberg, Daniel
Citterberg, Daniel
Niapos, Lefteris
Zadorozhnii, Oleksii
Tvrdoňová, Anna
Daradkeh, Samer
T Lepcio, Petr
Huang, Yong
Kepič, Peter
Hrdý, Radim
U Eliáš, Marek
S Danchuk, Viktor
Valášek, Daniel
Kovařík, Martin
T Prášek, Jan
Zezulka, Lukáš
Blahová, Lucie
Citterberg, Daniel
Tvrdoňová, Anna
Hrdý, Radim
Citterberg, Daniel
Kunc, Jan
Knauer, Sebastian
Caha, Ondřej
Kurowská, Anna
Valášek, Daniel
Hrdý, Radim
Štálnik, Jozef
Arregi Uribeetxebarria, Jon Ander
Gazdík, Richard
Mukherjee, Aniket
Pham, Sy Nguyen
Pejchalová, Lucie
Koňařík, Lukáš
Hashemi, Amir
Ruggiero, Amedeo
S Danchuk, Viktor
Průša, Stanislav
Děcký, Marek
Niapos, Lefteris
Lepcio, Petr

Upcoming trainings

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Term Name Description Max. attendees
20.5. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send (nano@ceitec.vutbr.cz) beforehand this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
21.5. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Alex Yohannan, Kaaviah Manoharan, AHMED ELOZIRI 2
21.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jeong Pil Kim, Kaaviah Manoharan 5
21.5. 13:30 - 15:30 RIE-flourine -training Before the training, you need to take a moodle course on dry etching and finish it with a quiz. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=30 Attendees: Claudia Lubrano, AHMED ELOZIRI, Gubakhanim Shahnazarova 3
21.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Xianghua Wu, Peter Kunnas, Hyesung Lee, Lukas Schretter, Hongbo Fu, Vladimír Prajzler 10
21.5. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Aida Fazlič, Xianghua Wu, Fateh Bahadur, AHMED ELOZIRI, Peter Kunnas, Hyesung Lee, Lukas Schretter, Hongbo Fu, Vladimír Prajzler, Lenka Michlovská 10
22.5. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle courses <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> and <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=38> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Fateh Bahadur, Peter Kunnas, Lukas Schretter 3
22.5. 09:00 - 09:45 Safety excursion Chem lab The Moodle course, Advanced Chemical Laboratory is MANDATORY for Safety Excursion. https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=151 Attendees: Aida Fazlič, Radha Bhardwaj, Sanjay Kumar, Claudia Lubrano, Hyesung Lee, Hongbo Fu 6
22.5. 14:00 - 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Lukas Schretter 1
23.5. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: AHMED ELOZIRI 2
23.5. 12:00 - 13:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Peter Kunnas 1
23.5. 13:30 - 15:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Fateh Bahadur 1
4.6. 09:00 - 16:00 LiteScope MIRA StAn - Basic training Basic training for LiteScope AFM-in-SEM, focused on the simultaneous topography and SEM measurement (CPEM). This training is prerequisite for other imaging modes. For more information, please refer to the moodle page: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=166 Attendees: Alex Yohannan, Kaaviah Manoharan 4
5.6. 09:30 - 11:30 MIRA-STAN - EDS detector Only for users with a valid Mira-STAN certificate. Meeting point at the microscope. Attendees: Alex Yohannan, Fateh Bahadur, Kaaviah Manoharan 4
5.6. 09:30 - 11:30 ICON-SPM basic training Before you assign for this practical training, complete all mandatory prerequisites on CF Moodle educational platform: https://cfmoodle.ceitec.vutbr.cz/ Two courses are mandatory: 1) Course Scanning probe microscopy basics (in section General training- Microscopy) 2) Course ICON-SPM – Bruker – Dimension ICON (in section Equipment training – Nanocharacterization laboratory) Sign up to the CF Moodle with the same login as you use for the booking system. Enroll to the above-mentioned courses and follow the instructions within the courses. If you have difficulties with enrolling yourself to a course or any other troubles with Moodle, contact evelina.gablech@ceitec.vutbr.cz for help. It is not possible to take part in practical training without completed mandatory prerequisites prior to the training! Courses must be completed until 31.5.2024. User will not receive any reminder to complete the courses. Thus, it is the user's full responsibility to meet the stated prerequisites by the given deadline. Practical training is only for 3 persons. If the capacity of the training is already full, please do not sign up. Meeting point: Directly in the SPM laboratory. Attendees: Dabosmita Paul 3
6.6. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Anna Konečná, Aida Fazlič 3
17.6. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send beforehand (nano@ceitec.vutbr.cz) this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
18.6. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
18.6. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
18.6. 14:25 - 14:55 Safety excursion - StAn lab 10
20.6. 09:00 - 15:30 MIRA-STAN part 1/2 Users must meet all prerequisites 3 days before the training to get admitted. More details are available at Ceitec Nano Moodle: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76 Meeting point at the microscope. This is a two-step training, register for the part 2 in our booking system. Attendees: Quynh Nhu Thi Tran, Muhammad Tahsin, Gubakhanim Shahnazarova, Hyesung Lee 4
26.6. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Gubakhanim Shahnazarova, Hyesung Lee 2
27.6. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. Attendees: Quynh Nhu Thi Tran, Muhammad Tahsin 2
27.6. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Alex Yohannan, Yue Wang, Hyesung Lee 3
15.7. 10:30 - 10:30 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send beforehand (nano@ceitec.vutbr.cz) this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. 5
16.7. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). 5
16.7. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
16.7. 14:25 - 14:55 Safety excursion - StAn lab 10
18.7. 09:00 - 15:30 MIRA-STAN part 1/2 Users must meet all prerequisites 3 days before the training to get admitted. More details are available at Ceitec Nano Moodle: https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=76 Meeting point at the microscope. This is a two-step training, register for the part 2 in our booking system. 4
25.7. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. 2
30.7. 09:00 - 12:30 MIRA-STAN part 2/2 SEM basic training, part 2/2 (Hands-on), only for users who attended the first part. Meeting point at the microscope. 2