CEITEC VUT Equipment

Upcoming trainings

Show more

Term	Name	Description	Max. attendees
24.5. 11:00 - 12:00	4-point probe	Attendees: Helena Šimůnková	2
25.5. 09:00 - 17:30	Amber	Meeting point at the microscope. Attendees: Rostislav Řepa, Jakub Šťastný	4
25.5. 09:30 - 12:30	MIRA-STAN - EDS detector	Only for users with an active MIRA-STAN certificate. Meeting point at the microscope. Attendees: Carolina Oliver Urrutia, Claudia Isabel Paredes Sánchez, Ondrej Kubinec, Ying Hu	4
26.5. 13:30 - 15:30	SUSS Wetbench training	Training of the new user Attendees: David Jonathan Walcher	1
27.5. 09:00 - 24.4. 14:00	LVEM_basic (1/2)	Attendees: Muhammad Tahsin, Anjali Valadi Palliyalil, Debika Devi Thongam	2
27.5. 09:00 - 13:30	Amber	Practice Attendees: Rostislav Řepa, Jakub Šťastný	1
28.5. 09:00 - 11:00	LVEM_basic (2/2)	Hands-on session Attendees: Anjali Valadi Palliyalil, Debika Devi Thongam	1
28.5. 12:00 - 14:00	LVEM_basic (2/2)	Hands-on session	1
3.6. 09:30 - 12:30	FTIR-CHEMLAB	Meeting point in Chemlab. Attendees: Lucie Žaloudková, Ying Hu, Iosif Tantis, Carolina Sanna, Debika Devi Thongam	3
15.6. 09:00 - 13:00	DHR	Basic rheology training. Meeting point at the rheometer. Attendees: Amirmohsen Fanisaberi, Carolina Sanna	2

	0:00	1:00	2:00	3:00	4:00	5:00	6:00	7:00	8:00	9:00	10:00	11:00	12:00	13:00	14:00	15:00	16:00	17:00	18:00	19:00	20:00	21:00	22:00	23:00
KRATOS-XPS
AMBER
WITEC-RAMAN
NANOSAM
UHV-LEEM
UHV-SPM
R4…
UHV-DEPOSITION
UHV-PREPARATION
LITESCOPE-MIRA…
LVEM
UHV-XPS
TITAN
ML3-BABY
MIRA-STAN
RIGAKU9
WOOLLAM-VIS
nano-CT
NANOCALC
MINIFLEX
nanoCT
SHAKER-B1.18
LaserMIRA
RSA
MIRA-EBL
SNOM-NANONICS
ICON-SPM
PARYLENE-SCS
RIE-CHLORINE
SUMMIT
SEE-SYSTEM
SIMS
RIGAKU3
RIE-FLUORINE
PARYLENE-DIENER
NIKON-NANO
NIRQUEST512
NMR
ZEISS-NANO
ULTRACENTRIFUGE
3D-PRUSA-BLUE
3D-PRUSA-BLACK
3D-PRUSA-ORANGE
TEM-SW
DIENER
PECVD
MIRKA
SAW-ACCUTOM
SPINCOATER…
Q-LAB
RTP
ACCURION_RSE
BET-ANAMET
SUSS-RCD8
STEMI
3D-PRUSA-XL
SW-BEAMER
CITOVAC
ULTRASONIC…
US-CUTTER
DWL
JASCO
JAZ3-CHANNEL
VACUUM_OVEN-C1…
FTIR-CHEMLAB
FTIR
VACUUM-OVEN-B1…
UHV…
VACUUM-OVEN-B1…
VUVAS
VISCOMETER
L450
WIRE-BONDER
XEF2
microCT
ZWICK
ZETASIZER
ULTRAFAST-LASER
UHV…
SW-LAB
TEST-RFID2
SW-TRACER
LEICA-TXP
TENUPOL
NANOSCAN
Test Ondra 3
Test O2
TEST2
Test školení
TGA96
UHV-CLUSTER
THEORY-SUPPORT
Heliscan
TGA-DISCOVERY
UHV-MBE1
UHV-MBE2
UHV-FTIR
UHV-LEIS
UHV-MBE
UHV-PLD
FISCHIONE-160
DSC-DISCOVERY
NanoOne250
FLOWBOX
DRIE
DHR
DIMPLING…
DRYING-OVEN-B1…
RAITH
SPONGEBOB
LECTROPOL
EVAPORATOR
ELECTROWORKSHOP
HELIOS
CRYOMILL
LYRA
4-POINT
FTIRMAG
FUMEHOOD…
FUMEHOOD-HF
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
FUMEHOOD…
SW-CT
VERSALAB
FUMEHOOD…
BET-DEGASSER
GLOVEBOX…
ALD-BENEQ
APCVD-Diffusion
ARES
APCVD
NANOWIZARD
ALD-FIJI
DISCO-DICING…
BAMBULAB
BRILLOUIN
TIC3X
TORNADO-M4
MECHANICAL…
CEITEC-NANO
TUBE-FURNACE
CLR-ISO8-Lab…
LEICACOAT-STAN
SW-COMSOL
LEXT
MINIEVAP
CPD
FUMEHOOD…
FUMEHOOD…
CITOPRESS
PROTOMAT
LIBS-FireFly
LIBS-Discovery
LIBS-LabSys1
LITESCOPE-LYRA
SUSS-WETBENCH
LPCVD-polySi
LPCVD-SiN
LAKESHORE
CRYOGENIC
KERR-MICROSCOPE
LASER-DICER
HENRY-MAGNET
MAGNETRON
WOOLLAM-RC2
SUSS-MA8
DEKTAK
LABOTOM5
WOOLLAM-MIR
MPS150
MONOWAVE
LAURELL-NANO
R2-PECVD
CLARUS-680
FRASCAN
Micromex
micro-CT-L240
micro-CT-m300
DAWN-HELEOS
TEGRAMIN
VNA-MPI
VERIOS
PECVD-NANOFAB
LEICACOAT-NANO
NANOINDENTER
KEITHLEY-4200
CHEMLAB-B1.14
CHEMLAB-B1.16
CHEMLAB-B1.18
IS-NOVOCONTROL
ZEISS-STAN
SCIA
FISCHIONE-TEM…
KAUFMAN
IR-RAMAN
K70
UV-LASER