Thursday 27.2.2020
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
VERIOS
SUSS-RCD8
SUSS-WETBENCH
EVAPORATOR
DWL
LEICACOAT-STAN
LYRA
ICON-SPM
KRATOS-XPS
WITEC-RAMAN
FUMEHOOD…
TITAN
RIGAKU9
CRYOGENIC
VERSALAB
DIENER
MAGNETRON
RIGAKU3
MECHANICAL…
UHV-LEIS
FUMEHOOD…
FUMEHOOD-HF
SUSS-MA8
UHV-LEEM
TEGRAMIN
UHV-XPS
VNA-MPI
DEKTAK
UHV-PREPARATION
MIRA-EBL
RAITH
DRIE
ZEISS-STAN
FTIR
DICING-SAW
PARYLENE
SEE-SYSTEM
LaserMIRA
SUMMIT
SIMS
MPS150
TERS
SNOM-NANONICS
NANOCALC
nanoCT
RIE-CHLORINE
RIE-FLUORINE
RFID-TEST
RTP
Q-LAB
SAW-ACCUTOM
PECVD
MIRA-STAN
THEORY-SUPPORT
STEMI
UHV-MBE
microCT
XEF2
WIRE-BONDER
VUVAS
CITOVAC
FTIR-CHEMLAB
JAZ3-CHANNEL
JASCO
US-CUTTER
ULTRAFAST-LASER
UHV-SPM
UHV-PLD
UHV-FTIR
BET-ANAMET
UHV-DEPOSITION
UHV-CLUSTER
UHV-MBE1
UHV-MBE2
3D-PRUSA-BLACK
TGA96
test mirka
FISCHIONE-160
TENUPOL
LEICA-TXP
SW-TRACER
SW-LAB
SW-BEAMER
3D-PRUSA-ORANGE
ML3-BABY
3D-PRUSA-BLUE
DIMPLING…
LEICACOAT-NANO
PECVD-NANOFAB
GLOVEBOX
DAWN-HELEOS
CLARUS-680
FUMEHOOD…
FTIRMAG
HELIOS
FLOWBOX
R4…
ELECTROWORKSHOP
LECTROPOL
SPONGEBOB
DHR
NANOINDENTER
CRYOMILL
TIC3X
CPD
MINIEVAP
LEXT
SW-COMSOL
CLR-ISO8-Lab…
TUBE-FURNACE
CEITEC-NANO
BRILLOUIN
BET-DEGASSER
ALD
NANOWIZARD
FRASCAN
CHEMLAB-B1.14
ULTRACENTRIFUGE
KERR-MICROSCOPE
ZEISS-NANO
NMR
WOOLLAM-VIS
NIRQUEST512
NANOSAM
NANOSCAN
CITOPRESS
MONOWAVE
APCVD
WOOLLAM-MIR
LABOTOM5
MOCVD
HENRY-MAGNET
PROTOMAT
SCIA
LAKESHORE
LPCVD-SiN
LPCVD-polySi
LITESCOPE-MIRA…
LITESCOPE-LYRA
LIBS-Discovery
LIBS FireFly
LAURELL-NANO
LASER-DICER
R2-PECVD
KEITHLEY-4200
IR-RAMAN
KAUFMAN
FISCHIONE-TEM…
ZETASIZER
Holobrádek, Jakub
Redondo Negrete, Edurne
Erdem Ince, Ahmet
Tan, Hua
Jindrová, Eva
Šťastný, Přemysl
Iffelsberger, Christian
Musálek, Tomáš
Midlik, Šimon
Midlik, Šimon
Pálesch, Erik
Midlik, Šimon
Hrdý, Radim
Hrdý, Radim
Gomez Perez, Inmaculada Jennifer
Liška, Jiří
Pálesch, Erik
Midlik, Šimon
Midlik, Šimon
Tesař, Jan
Fecko, Peter
Midlik, Šimon
Midlik, Šimon
Warmowska MSc, Dominika
Jindrová, Eva
Erdem Ince, Ahmet
Šťastný, Přemysl
Blahová, Lucie
Prajzler, Vladimír
Krpenský, Jan
Turčan, Igor
Konečný, Martin
Motyčková, Lucie
Wess, Martin
Lednický, Tomáš
Lednický, Tomáš
Sampathkumar, Krishna
Tesař, Jan
Midlik, Šimon
Jelénková, Klára
Zahradníček, Radim
Horák, Michal
Ander Arregi Uribeetxebarria, Jon
Novák, Jiří
Jelénková, Klára
Zhang, Xixia
Horký, Michal
Horký, Michal
Kolíbal, Miroslav
Hrdý, Radim
Jelénková, Klára
Motyčková, Lucie
Drdlík, Daniel
Šťastný, Přemysl
Varga, Dominik
Varga, Dominik
Průša, Stanislav
Hrdý, Radim
Rovenská, Katarína
B Švarc, Vojtěch
Čechal, Jan
Šťastný, Přemysl
Čechal, Jan
Vaňatka, Marek
Liška, Jiří
Čechal, Jan
Liška, Jiří
Martyniuk, Oleh
U Eliáš, Marek
T Holas, Jiří
Tinoco Navarro, Lizeth Katherine
Klusák, Radovan

Upcoming trainings

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Term Name Description Max. attendees
28.3. 09:00 - 12:00 MIRA-EBL training Meeting point: in the front of user office 2
28.3. 09:30 - 12:00 ALD-training Attendees: Shaista Nouseen, Parth Nitinkumar Thakkar, Radha Bhardwaj 3
2.4. 13:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle course <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Babasaheb Waghmode, Sunny Nandi, Sanjay Kumar 3
2.4. 14:00 - 2.5. 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Sunny Nandi 1
2.4. 15:00 - 15:00 SUSS Wetbench training new users training Attendees: AHMED ELOZIRI 2
3.4. 09:00 - 10:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Babasaheb Waghmode 1
3.4. 10:30 - 12:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Sanjay Kumar 1
4.4. 09:00 - 11:00 ICON-SPM basic training Before you assign for this practical training, complete all mandatory prerequisites on CF Moodle educational platform: https://cfmoodle.ceitec.vutbr.cz/ Two courses are mandatory: 1) Course Scanning probe microscopy basics (in section General training- Microscopy) 2) Course ICON-SPM – Bruker – Dimension ICON (in section Equipment training – Nanocharacterization laboratory) Sign up to the CF Moodle with the same login as you use for the booking system. Enroll to the above-mentioned courses and follow the instructions within the courses. If you have difficulties with enrolling yourself to a course or any other troubles with Moodle, contact evelina.gablech@ceitec.vutbr.cz for help. It is not possible to take part in practical training without completed mandatory prerequisites prior to the training! Courses must be completed 1 day prior to the training (until 3.4.). User will not receive any reminder to complete the courses. Thus, it is the user's full responsibility to meet the stated prerequisites by the given deadline. Practical training is only for 3 persons. If the capacity of the training is already full, please do not sign up. Meeting point: Directly in the SPM laboratory. Attendees: Pavlína Šárfy, Parth Nitinkumar Thakkar 3
4.4. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Alex Yohannan, Fateh Bahadur 3
4.4. 14:00 - 16:00 Basic Ellipsometry Ellipsometry in UV/VIS with Woollam VASE Attendees: Sy Nguyen Pham 4
5.4. 09:30 - 10:30 ICON-SPM advanced training (MFM) Mandatory prerequisites: Completed ICON-SPM basic training process (user should already have an authorization for ICON-SPM). If the capacity of the training is full, please do not sign up and request for another training at the guarantor. Meeting point: SPM laboratory. Attendees: Sy Nguyen Pham, Fateh Bahadur 2
11.4. 09:30 - 12:30 NMR training Only for users of Chemical Lab Attendees: Xia Peng, Pavlína Šárfy, Shaista Nouseen, Xiaohui Ju 4
15.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send (nano@ceitec.vutbr.cz) beforehand this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. Attendees: Minitha Cherukutty Ramakrishnan, Jan Šabata, Aparna Neettiyath, Claudia Lubrano 5
16.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle course <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Dabosmita Paul, Marek Rotter, Muhammad Tahsin, Hoang-Anh Cao, Alex Yohannan, Radha Bhardwaj 3
16.4. 12:10 - 12:50 Safety excursion Chem lab Read the Moodle course: Advanced Chemical Laboratory Attendees: Dabosmita Paul, Radha Bhardwaj, Sanjay Kumar, Kaaviah Manoharan, Aparna Neettiyath 5
16.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Minitha Cherukutty Ramakrishnan, Jan Šabata, Aparna Neettiyath, Claudia Lubrano 5
16.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Jan Šabata, Kaaviah Manoharan, Aparna Neettiyath, Claudia Lubrano 10
16.4. 14:00 - 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Hoang-Anh Cao 1
16.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Jan Šabata, Kaaviah Manoharan, Aparna Neettiyath, Claudia Lubrano 10
17.4. 09:00 - 10:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. 1
17.4. 10:30 - 12:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Radha Bhardwaj 1
18.4. 09:30 - 13:00 ALD-training Attendees: Karel Vařeka, Minitha Cherukutty Ramakrishnan, Aparna Neettiyath 3
21.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jeong Pil Kim, Kaaviah Manoharan 5
21.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
21.5. 14:25 - 14:55 Safety excursion - StAn lab 10