Thursday 27.6.2019
CEITEC Nano Research Infrastructure http://nano.ceitec.cz/
0:00 1:00 2:00 3:00 4:00 5:00 6:00 7:00 8:00 9:00 10:00 11:00 12:00 13:00 14:00 15:00 16:00 17:00 18:00 19:00 20:00 21:00 22:00 23:00
SUSS-WETBENCH
KRATOS-XPS
RIGAKU3
EVAPORATOR
DIENER
WITEC-RAMAN
WIRE-BONDER
LYRA
UHV-PLD
SUMMIT
DWL
HELIOS
SUSS-MA8
RIE-FLUORINE
UHV-DEPOSITION
TITAN
DEKTAK
RIGAKU9
SUSS-RCD8
FUMEHOOD…
FUMEHOOD…
MPS150
TEGRAMIN
SCIA
DICING-SAW
LASER-DICER
MAGNETRON
SIMS
3D-PRUSA-BLUE
RAITH
UHV-LEIS
JAZ3-CHANNEL
UHV-PREPARATION
ALD
FTIR
UHV-FTIR
ICON-SPM
TERS
SNOM-NANONICS
MIRA-EBL
nanoCT
RIE-CHLORINE
FTIR-CHEMLAB
RFID-TEST
CITOVAC
JASCO
VUVAS
XEF2
microCT
RTP
Q-LAB
SAW-ACCUTOM
PECVD
3D-PRUSA-ORANGE
3D-PRUSA-BLACK
PARYLENE
LaserMIRA
SEE-SYSTEM
TENUPOL
UHV-CLUSTER
UHV-MBE
UHV-MBE1
UHV-MBE2
THEORY-SUPPORT
TGA96
UHV-XPS
test mirka
ULTRACENTRIFUGE
LEICA-TXP
UHV-LEEM
SW-TRACER
SW-LAB
SW-BEAMER
BET-ANAMET
STEMI
NANOCALC
MIRA-STAN
UHV-SPM
ULTRAFAST-LASER
US-CUTTER
FISCHIONE-160
ML3-BABY
ZEISS-NANO
DRIE
VNA-MPI
GLOVEBOX
DAWN-HELEOS
CLARUS-680
FUMEHOOD…
FUMEHOOD-HF
FTIRMAG
FLOWBOX
R4…
ELECTROWORKSHOP
LECTROPOL
SPONGEBOB
DIMPLING…
DHR
CRYOMILL
PECVD-NANOFAB
VERSALAB
TIC3X
CPD
MINIEVAP
LEXT
SW-COMSOL
LEICACOAT-STAN
CLR-ISO8-Lab…
TUBE-FURNACE
CEITEC-NANO
MECHANICAL…
BRILLOUIN
BET-DEGASSER
NANOWIZARD
VERIOS
LEICACOAT-NANO
NMR
LAKESHORE
WOOLLAM-VIS
NIRQUEST512
NANOSAM
NANOSCAN
CITOPRESS
MONOWAVE
APCVD
WOOLLAM-MIR
LABOTOM5
MOCVD
HENRY-MAGNET
KERR-MICROSCOPE
PROTOMAT
CRYOGENIC
LPCVD-SiN
FRASCAN
LPCVD-polySi
LITESCOPE-MIRA…
LITESCOPE-LYRA
LIBS-Discovery
LIBS FireFly
LAURELL-NANO
R2-PECVD
KEITHLEY-4200
IR-RAMAN
KAUFMAN
FISCHIONE-TEM…
ZEISS-STAN
CHEMLAB-B1.14
NANOINDENTER
ZETASIZER
Fernandez Baldis, Federico
Slavík, Jan
Prášek, Jan
Slavík, Jan
Kepič, Peter
Polčák, Josef
Lednický, Tomáš
Polčák, Josef
Polčák, Josef
Roupcová, Pavla
Kurdík, Stanislav
Roupcová, Pavla
Fernandez Baldis, Federico
Sampathkumar, Krishna
Kepič, Peter
Zhang, Xixia
Kejík, Lukáš
Zahradníček, Radim
Konečný, Martin
Gomez Perez, Inmaculada Jennifer
Zhang, Xixia
Liška, Jiří
Dhankhar, Meena
Solodovnyk, Artur
Nováček, Zdeněk
Horký, Michal
Horký, Michal
Horký, Michal
Janák, Marcel
Janák, Marcel
Gablech, Imrich
Slavík, Jan
B Man, Ondřej
Lednický, Tomáš
Zahradníček, Radim
Prášek, Jan
Slavík, Jan
Slavík, Jan
Kolíbal, Miroslav
Otevřel, Marek
Pizúrová, Naděžda
Pizúrová, Naděžda
Slavík, Jan
Slavík, Jan
Caha, Ondřej
Roupcová, Pavla
Zahradníček, Radim
Zahradníček, Radim
Slavík, Jan
Prášek, Jan
Vančík, Silvester
Šťastný, Přemysl
Prášek, Jan
Sadílek, Jakub
Kepič, Peter
U Eliáš, Marek
Bábor, Petr
Flajšman, Lukáš
Fernandez Baldis, Federico
Průša, Stanislav
Lednický, Tomáš
Čechal, Jan
Zahradníček, Radim
T Nebojsa, Alois

Upcoming trainings

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Term Name Description Max. attendees
28.3. 09:00 - 12:00 MIRA-EBL training Meeting point: in the front of user office 2
28.3. 09:30 - 12:00 ALD-training Attendees: Shaista Nouseen, Parth Nitinkumar Thakkar, Radha Bhardwaj 3
2.4. 13:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle course <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Babasaheb Waghmode, Sunny Nandi, Sanjay Kumar 3
2.4. 14:00 - 2.5. 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Sunny Nandi 1
2.4. 15:00 - 15:00 SUSS Wetbench training new users training Attendees: AHMED ELOZIRI 2
3.4. 09:00 - 10:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Babasaheb Waghmode 1
3.4. 10:30 - 12:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Sanjay Kumar 1
4.4. 09:00 - 11:00 ICON-SPM basic training Before you assign for this practical training, complete all mandatory prerequisites on CF Moodle educational platform: https://cfmoodle.ceitec.vutbr.cz/ Two courses are mandatory: 1) Course Scanning probe microscopy basics (in section General training- Microscopy) 2) Course ICON-SPM – Bruker – Dimension ICON (in section Equipment training – Nanocharacterization laboratory) Sign up to the CF Moodle with the same login as you use for the booking system. Enroll to the above-mentioned courses and follow the instructions within the courses. If you have difficulties with enrolling yourself to a course or any other troubles with Moodle, contact evelina.gablech@ceitec.vutbr.cz for help. It is not possible to take part in practical training without completed mandatory prerequisites prior to the training! Courses must be completed 1 day prior to the training (until 3.4.). User will not receive any reminder to complete the courses. Thus, it is the user's full responsibility to meet the stated prerequisites by the given deadline. Practical training is only for 3 persons. If the capacity of the training is already full, please do not sign up. Meeting point: Directly in the SPM laboratory. Attendees: Pavlína Šárfy, Parth Nitinkumar Thakkar 3
4.4. 13:00 - 17:00 Rigaku3-basic Bring your typical sample. A1.15 Go through: https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=429 https://cfmoodle.ceitec.vutbr.cz/mod/lesson/view.php?id=444 Attendees: Alex Yohannan, Fateh Bahadur 3
4.4. 14:00 - 16:00 Basic Ellipsometry Ellipsometry in UV/VIS with Woollam VASE Attendees: Sy Nguyen Pham 4
5.4. 09:30 - 10:30 ICON-SPM advanced training (MFM) Mandatory prerequisites: Completed ICON-SPM basic training process (user should already have an authorization for ICON-SPM). If the capacity of the training is full, please do not sign up and request for another training at the guarantor. Meeting point: SPM laboratory. Attendees: Sy Nguyen Pham, Fateh Bahadur 2
11.4. 09:30 - 12:30 NMR training Only for users of Chemical Lab Attendees: Xia Peng, Pavlína Šárfy, Shaista Nouseen, Xiaohui Ju 4
15.4. 10:30 - 11:15 Nanofab interview - Meeting room C2.11 or C2.07 This interview is mandatory for enrollment to the Safety excursion - Nanofabrication lab. Please bring or send (nano@ceitec.vutbr.cz) beforehand this completed form: https://nano.ceitec.cz/download/1132. Attendance is possible in person (preferred) or online via Teams. The link will be sent to each user a day before at the latest. Attendees: Minitha Cherukutty Ramakrishnan, Jan Šabata, Aparna Neettiyath, Claudia Lubrano 5
16.4. 09:00 - 13:00 Verios_basic (1/2) Verios_basic (1/2): training for new users, demonstration part. Prerequisite: 1) successfully completed Moodle course <https://cfmoodle.ceitec.vutbr.cz/course/view.php?id=148> + 2) your typical sample ready for a subsequent hands-on session. Meeting point: entrance to StAn CLR labs (bldg. A, 1st floor). Bring your set of cleanroom stationery if you have one. Register one slot for the Verios_basic (2/2) hands-on session to complete the training curriculum. Attendees: Dabosmita Paul, Marek Rotter, Muhammad Tahsin, Hoang-Anh Cao, Alex Yohannan, Radha Bhardwaj 3
16.4. 12:10 - 12:50 Safety excursion Chem lab Read the Moodle course: Advanced Chemical Laboratory Attendees: Dabosmita Paul, Radha Bhardwaj, Sanjay Kumar, Kaaviah Manoharan, Aparna Neettiyath 5
16.4. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Minitha Cherukutty Ramakrishnan, Jan Šabata, Aparna Neettiyath, Claudia Lubrano 5
16.4. 13:55 - 14:20 Safety excursion - Nanocharacterization lab Attendees: Jan Šabata, Kaaviah Manoharan, Aparna Neettiyath, Claudia Lubrano 10
16.4. 14:00 - 15:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Hoang-Anh Cao 1
16.4. 14:25 - 14:55 Safety excursion - StAn lab Attendees: Jan Šabata, Kaaviah Manoharan, Aparna Neettiyath, Claudia Lubrano 10
17.4. 09:00 - 10:30 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. 1
17.4. 10:30 - 12:00 Verios_basic hands-on session (2/2) Verios_basic hands-on session (2/2). Bring your real sample(s) with you. Prerequisite = completed Verios_basic (1/2) demonstration part of the training. Attendees: Radha Bhardwaj 1
18.4. 09:30 - 13:00 ALD-training Attendees: Karel Vařeka, Minitha Cherukutty Ramakrishnan, Aparna Neettiyath 3
21.5. 13:00 - 13:50 Safety excursion - Nanofabrication lab Please enroll in this training only in parallel with the "Nanofab interview." Do not enroll in training ahead of time, but when you are sure you will be using nanofabrication techniques. It is possible to pass this training anytime during your access additionally (it takes place at least once a month). Attendees: Jeong Pil Kim, Kaaviah Manoharan 5
21.5. 13:55 - 14:20 Safety excursion - Nanocharacterization lab 10
21.5. 14:25 - 14:55 Safety excursion - StAn lab 10